Synthesis, structure, microstructure and mechanical characteristics of MO CVD deposited zirconia films

被引：48
作者：
Bernard, O.
Huntz, A. M.
Andrieux, M. [1 ]
Seiler, W.
Ji, V.
Poissonnet, S.
机构：
[1] Univ Paris 11, CNRS UMR 8182, ICMMO, LEMHE, F-91405 Orsay, France
[2] ENSAM, UMR CNRS, LIM, F-75013 Paris, France
[3] CEA Saclay, SRMP, F-91191 Gif Sur Yvette, France
来源：
APPLIED SURFACE SCIENCE | 2007年 / 253卷 / 10期
关键词：
thin films; zirconia; monoclinic phase; tetragonal phase; mechanical properties; micro- and nano-indentation;
D O I：
10.1016/j.apsusc.2006.10.025
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Zirconia (ZrO2) thin films were deposited by metal organic chemical vapor deposition (MOCVD) on (10 0) Si over temperature and pressure ranges from 700 to 900 degrees C and 100 to 2000 Pa, respectively. The oxide films were characterized. by field emission microscopy and X-ray diffraction so that microstructure and ratios of monoclinic and tetragonal phases could be estimated according to the process conditions. The mechanical behaviour of the substrate-film systems was investigated using Vickers micro-indentation and Berkovitch nano-indentation tests. The characteristics of silicon are not modified by the presence of a thin film of silicon oxide (10 nm), formed in the reactor during heating. Young's modulus and the hardness of tetragonal zirconia phase, 220 and 15 GPa, respectively, are greater than values obtained for monoclinic phase, 160 and 7 GPa, respectively. The zirconia films are well adherent and the toughness of tetragonal zirconia phase is greater than that of monoclinic phase. (c) 2006 Elsevier B.V. All rights reserved.
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页码：4626 / 4640
页数：15
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