Scanning tunneling microscopy of plasma-solid surface interface

被引：1

作者：

Kawasaki, H ^{[1
]}

Ara, K ^{[1
]}

Terashima, K ^{[1
]}

机构：

[1] Univ Tokyo, Grad Sch Engn, Dept Met & Mat Sci, Bunkyo Ku, Tokyo 1138654, Japan

来源：

THIN SOLID FILMS | 2000年 / 374卷 / 02期

关键词：

plasma; plasma-solid interface; STM; plasma etching;

D O I：

10.1016/S0040-6090(00)01147-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A plasma-solid surface reaction on the nanometer scale was observed in situ for the first time. This was achieved by employing special scanning tunneling microscopy (STM) that could be operated in a plasma environment. To prevent current due to noise from the plasma, the probe tip was coated with epoxy grease and insulating glass. The apex of the probe tip was sharpened by a focused ion beam (FIB). This special STM had sufficient stability and reproducibility to measure a 10 x 10 mum(2) region for more than 5 h in a plasma environment. Using this apparatus, sequential in situ STM images of highly oriented pyrolytic graphite (HOPG) were obtained in a radio-frequency (rf) (430 MHz) low-pressure (1 torr) air glow plasma. These images revealed that a projection of over 100 nm in height was etched by the plasma and removed. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：162 / 166

页数：5