Ion Implanted Integrated Optics (I30) technology for planar lightwave circuits fabrication

被引：6

作者：

Drouard, E

Escoubas, L

Flory, F

Tisserand, S

Roux, L

机构：

[1] CNRS, Inst Fresnel, UMR, EGIM, F-13397 Marseille, France

[2] SILOS Technol, F-13790 Peynier, France

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 2004年 / 22卷 / 10期

关键词：

bent waveguide; fiber coupling; integrated optics; ion implantation; passive integrated circuits;

D O I：

10.1109/JLT.2004.833285

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The Ion Implanted Integrated Optics (I3O) technology, using titanium ion implantation in bulk silica to fabricate passive compact planar lightwave circuits (PLCs), is presented in this paper. Its advantages are described and compared with other waveguide fabrication technologies. It is demonstrated that the guided electromagnetic field can be tailored by adjusting the titanium ion dose either to fit the guided mode of standard single-mode fibers or to allow a sharp radius of curvature of bent waveguides.

引用

页码：2310 / 2315

页数：6

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