Anisotropic pyrochemical dry etching of fluorinated ethylene propylene induced by pre-irradiation with synchrotron radiation

Anisotropic pyrochemical micro-etching induced by synchrotron x-ray irradiation is developed as a microfabrication process for fluorinated ethylene propylene (FEP). X-ray irradiation is performed at room temperature, and the irradiation area is etched by heating in an oven. By measuring the irradiation area using Raman spectroscopy, the peak of the Raman spectrum is shown to decrease with an increasing irradiation dose. It is also observed that the etching can be performed at a heating temperature of around 200 degrees C while maintaining the chemical composition of the surface. The etching mechanism is speculated to be as follows: x-ray irradiation causes chain scission, which decreases the number-average degree of polymerization. The melting temperature of irradiated FEP decreases as the polymer chain length is decreased so that the irradiated area can be evaporated at low temperatures of post-heating. In this way, we demonstrate that anisotropic pyrochemical micro-etching of FEP proceeds only in the depth direction where x rays are absorbed. It is possible to avoid deterioration of the shape accuracy arising from thermal expansion during the transfer process of the mask pattern by separating pre-irradiation from post-heating. Through this method, it becomes possible to realize a high precision microstructure of FEP in a large area.