Thermal distributions of surface states causing the current collapse in unpassivated AlGaN/GaN heterostructure field-effect transistors

被引:17
作者
Oh, CS [1 ]
Youn, CJ
Yang, GM
Lim, KY
Yang, JW
机构
[1] Chonbuk Natl Univ, Dept Semicond Sci & Technol, Chonju 561756, South Korea
[2] Chonbuk Natl Univ, Semicond Phys Res Ctr, Chonju 561756, South Korea
基金
新加坡国家研究基金会;
关键词
D O I
10.1063/1.1844610
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dc characteristics of the AlGaN/GaN heterostructure field-effect transistors were examined at temperatures ranging from 25 to 260 degreesC under white light illumination. Drain current collapse measured was defined by the difference of drain current between light on and light off at V-gs=1 V and V-ds=5 V. The surface-passivated device showed no drain current collapse, but the unpassivated device showed severe drain current collapse at 25 degreesC. Drain current and drain current collapse with an increase in temperature reduced, which resulted from the reduction of the electron mobility or saturation velocity and the thermal activation of the trapped electrons, respectively. Eventually, drain current collapse disappeared completely above 250 degreesC. The behavior of the temperature-dependent drain current collapse showed that the surface states for trapping electrons were continuously distributed with the temperature not having specific energy states. (C) 2005 American Institute of Physics.
引用
收藏
页码:012106 / 1
页数:3
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