ANALYSIS OF JFC ADSORPTION EFFECT ON SURFACE ROUGHNESS OF ALUMINUM FOR ALKALINE CMP BY EIS

被引：0

作者：

Wang, Zhi ^{[1
,2
]}

Sun, Ming ^{[1
,2
]}

Niu, Xinhuan ^{[1
,2
]}

Zhou, Jiakai ^{[1
,2
]}

Cui, Yaqi ^{[1
,2
]}

机构：

[1] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin Key Lab Elect Mat & Devices, Tianjin 300130, Peoples R China

[2] Hebei Univ Technol, Inst Microelect, Tianjin 300130, Peoples R China

来源：

2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC) | 2019年

基金：

中国国家自然科学基金;

关键词：

JFC; aluminum; EIS; surface roughness; CORROSION; STEEL;

D O I：

10.1109/cstic.2019.8755795

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Effect of JFC in the alkaline slurry on aluminum surface roughness after CMP was analyzed by electrochemical impedance spectroscopy (EIS) and aluminum surface measurement. The diameter of capacitance semicircle with the charge transfer resistance in high frequency area increases as the conc. of JFC surfactant increases from 0 ml/L to 5 ml/L. Meanwhile, The Al surface turns to be hydrophilic with the contact Angle decreased by 71%, and the surface tension decreased by 74% as well. Furthermore, the surface roughness of Al is significantly reduced at presence of JFC contrasted with absence. The non-ions surfactant with the physical adsorption on the Al/solution interface could improve the interfacial intension by modifying aluminum surface with super hydrophilic for enhanced uniformity of polishing process.

引用

页数：3

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