Lead zirconium titanate thin films prepared by thermal annealing of multilayer structures composed of PbO, ZrO2 and TiO2

被引:1
作者
Kang, Byung Sun [1 ]
Lee, Won Gyu [1 ]
机构
[1] Kangwon Natl Univ, Dept Chem Engn, Chunchon 200701, Kangwon, South Korea
关键词
PZT; Multilayer structure; Thermal interdiffusion; MOCVD; CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE; PB(ZR; PBTIO3; PZT;
D O I
10.1016/j.jiec.2009.09.047
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Lead zirconium titanate [Pb(ZrxTi1-x)O-3 or PZT] thin films were prepared by the thermal annealing of multilayer films composed of binary oxide layers of PbO, ZrO2 and TiO2. The binary oxides were deposited by metal organic chemical vapor deposition. An interdiffusion reaction for perovskite PZT thin films was initiated at approximately 550 degrees C and nearly completed at 750 degrees C for 1 h under O-2 annealing atmosphere. The composition of Pb/Zr/Ti in perovskite PZT could be controlled by the thickness ratio of PbO/ZrO2/TiO2 where the contribution of each binary oxide at the same thickness was 1:0.55:0.94. The electrical properties of PZT (Zr/Ti = 40/60, 300 nm) prepared on a Pt-coated substrate included a dielectric constant epsilon(r) of 475, a coercive field E-c of 320 kV/cm, and remnant polarization P-r of 11 mu C/cm(2) at an applied voltage of 18 V. (C) 2009 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
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页码:694 / 698
页数:5
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