Single-source MOCVD of Y-, Ba- and Cu-oxides from thd-precursors

被引：15

作者：

Klippe, L

Wahl, G

机构：

[1] Inst. Oberflachentechnik/P., TU Braunschweig, 38108 Braunschweig

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 1997年 / 251卷 / 1-2期

关键词：

MOCVD; thin films; deposition kinetics;

D O I：

10.1016/S0925-8388(96)02681-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A new developed single-source MOCVD technique has been investigated with respect to its applicability in a long term deposition process. In-situ measurements of the deposition rates demonstrated the constance of the process. Additionally the deposition kinetics of Y-, Ba- and Cu- single and mixed oxides from thd-compounds was studied. The measurements revealed a remarkably low decomposition temperature of Cu(thd)(2) on CuO surfaces.

引用

页码：249 / 253

页数：5

共 10 条

[1] DEPOSITION OF OXIDE LAYERS BY COMPUTER-CONTROLLED INJECTION-LPCVD [J].

FELTEN, F ;

SENATEUR, JP ;

WEISS, F ;

MADAR, R ;

ABRUTIS, A .

JOURNAL DE PHYSIQUE IV, 1995, 5 (C5) :1079-1086

[2] SINGLE SOURCE MOCVD OF EPITAXIAL OXIDE THIN-FILMS [J].

HISKES, R ;

DICAROLIS, SA ;

JACOWITZ, RD ;

LU, Z ;

FEIGELSON, RS ;

ROUTE, RK ;

YOUNG, JL .

JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) :781-787

[3] NEW PRINCIPLE OF FEEDING FOR FLASH EVAPORATION MOCVD DEVICES [J].

KAUL, AR ;

SELEZNEV, BV .

JOURNAL DE PHYSIQUE IV, 1993, 3 (C3) :375-378

[4]

Klippe L, 1995, INST PHYS CONF SER, V148, P611

[5] Deposition of PbTiO3 thin films from thd-complexes by an aerosol source MOCVD method [J].

Korsakov, IE ;

Kaul, AR ;

Klippe, L ;

Korn, J ;

Krause, U ;

Pulver, M ;

Wahl, G .

MICROELECTRONIC ENGINEERING, 1995, 29 (1-4) :205-208

[6] METALORGANIC CHEMICAL VAPOR-DEPOSITION USING A SINGLE SOLUTION SOURCE FOR HIGH-JC Y1BA2CU3O7-X SUPERCONDUCTING FILMS [J].

MATSUNO, S ;

UCHIKAWA, F ;

UTSUNOMIYA, S ;

NAKABAYASHI, S .

APPLIED PHYSICS LETTERS, 1992, 60 (19) :2427-2429

[7]

Richards BC, 1995, INST PHYS CONF SER, V148, P891

[8] AEROSOL ASSISTED CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTING YBA2CU3O7-X [J].

SALAZAR, KV ;

OTT, KC ;

DYE, RC ;

HUBBARD, KM ;

PETERSON, EJ ;

COULTER, JY ;

KODAS, TT .

PHYSICA C, 1992, 198 (3-4) :303-308

[9]

SCHMADERER F, 1990, P 11 INT C CVD SEATT, P211

[10] PREPARATION OF YBA2CU3O7 FILMS BY LOW-PRESSURE MOCVD USING LIQUID SOLUTION SOURCES [J].

WEISS, F ;

FROHLICH, K ;

HAASE, R ;

LABEAU, M ;

SELBMANN, D ;

SENATEUR, JP ;

THOMAS, O .

JOURNAL DE PHYSIQUE IV, 1993, 3 (C3) :321-328

← 1 →