Electrical and optical properties of Nb-doped TiO2 films deposited by dc magnetron sputtering using slightly reduced Nb-doped TiO2-x ceramic targets

被引：32

作者：

Sato, Yasushi ^{[1
]}

Sanno, Yuta ^{[1
]}

Tasaki, Chihiro ^{[1
]}

Oka, Nobuto ^{[1
]}

Kamiyama, Toshihisa ^{[2
]}

Shigesato, Yuzo ^{[1
]}

机构：

[1] Aoyama Gakuin Univ, Grad Sch Sci & Engn, Kanagawa 2298558, Japan

[2] AGC Ceram Co Ltd, Takasago, Hyogo 6768655, Japan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2010年 / 28卷 / 04期

关键词：

IN2O3; FILMS;

D O I：

10.1116/1.3358153

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Nb-doped anatase TiO2 films were deposited on unheated glass by dc magnetron sputtering using slightly reduced Nb-doped TiO2-x targets (Nb concentration: 3.7 and 9.5 at. %) with various hydrogen or oxygen flow ratios. After postannealing in a vacuum (6 x 10(-4) Pa) at 500 degrees C for 1 h, both films were crystallized into the polycrystalline anatase TiO2 structure. The resistivity decreased from 1.6 X 10(-3) to 6.3 X 10(-4) Omega cm with increasing Nb concentration from 2.8 to 8.0 at. %, where the carrier density increased from 5.4 X 10(20) to 2.0 X 10(21) cm(-3) and the Hall mobility was almost constant at 5-7 cm(2) V-1 s(-1). The films exhibited a high transparency of over 60%-80% in the visible region. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3358153]

引用

页码：851 / 855

页数：5

共 19 条

[1] Electronic and optical properties of anatase TiO2
Asahi, R
Taga, Y
Mannstadt, W
Freeman, AJ
[J]. PHYSICAL REVIEW B, 2000, 61 (11) : 7459 - 7465
[2] ELECTRICAL-PROPERTIES AND DEFECT MODEL OF TIN-DOPED INDIUM OXIDE LAYERS
FRANK, G
KOSTLIN, H
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 27 (04): : 197 - 206
[3] A transparent metal:: Nb-doped anatase TiO2 -: art. no. 252101
Furubayashi, Y
Hitosugi, T
Yamamoto, Y
Inaba, K
Kinoda, G
Hirose, Y
Shimada, T
Hasegawa, T
[J]. APPLIED PHYSICS LETTERS, 2005, 86 (25) : 1 - 3
[4] Transport properties of d-electron-based transparent conducting oxide:: Anatase Ti1-xNbxO2
Furubayashi, Yutaka
Yamada, Naoomi
Hirose, Yasushi
Yamamoto, Yukio
Otani, Makoto
Hitosugi, Taro
Shimada, Toshihiro
Hasegawa, Tetsuya
[J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (09)
[5] rf magnetron sputter deposition of transparent conducting Nb-doped TiO2 films on SrTiO3
Gillispie, Meagen A.
van Hest, Maikel F. A. M.
Dabney, Matthew S.
Perkins, John D.
Ginley, David S.
[J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)
[6] EVAPORATED SN-DOPED IN2O3 FILMS - BASIC OPTICAL-PROPERTIES AND APPLICATIONS TO ENERGY-EFFICIENT WINDOWS
HAMBERG, I
GRANQVIST, CG
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) : R123 - R159
[7] Fabrication of highly conductive Ti1-xNbxO2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition
Hitosugi, T.
Ueda, A.
Nakao, S.
Yamada, N.
Furubayashi, Y.
Hirose, Y.
Shimada, T.
Hasegawa, T.
[J]. APPLIED PHYSICS LETTERS, 2007, 90 (21)
[8] LOW RESISTIVITY INDIUM TIN OXIDE TRANSPARENT CONDUCTIVE FILMS .2. EFFECT OF SPUTTERING VOLTAGE ON ELECTRICAL PROPERTY OF FILMS
ISHIBASHI, S
HIGUCHI, Y
OTA, Y
NAKAMURA, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1403 - 1406
[9] Carrier generation and transport properties of heavily Nb-doped anatase TiO2 epitaxial films at high temperatures
Kurita, Daisuke
Ohta, Shingo
Sugiura, Kenji
Ohta, Hiromichi
Koumoto, Kunihito
[J]. JOURNAL OF APPLIED PHYSICS, 2006, 100 (09)
[10] Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Ohno, S
Takasawa, N
Sato, Y
Yoshikawa, M
Suzuki, K
Frach, P
Shigesato, Y
[J]. THIN SOLID FILMS, 2006, 496 (01) : 126 - 130

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