Bandgap engineering of two-dimensional C3N bilayers

被引:53
作者
Wei, Wenya [1 ,2 ]
Yang, Siwei [3 ,4 ]
Wang, Gang [5 ]
Zhang, Teng [6 ]
Pan, Wei [1 ]
Cai, Zenghua [1 ]
Yang, Yucheng [3 ,4 ]
Zheng, Li [3 ,4 ]
He, Peng [3 ,4 ]
Wang, Lei [1 ]
Baktash, Ardeshir [2 ]
Zhang, Quanzhen [6 ]
Liu, Liwei [6 ]
Wang, Yeliang [6 ]
Ding, Guqiao [3 ,4 ]
Kang, Zhenhui [7 ,8 ]
Yakobson, Boris I. [9 ]
Searles, Debra J. [2 ,10 ]
Yuan, Qinghong [1 ,2 ]
机构
[1] East China Normal Univ, State Key Lab Precis Spect, Sch Phys & Elect Sci, Key Lab Polar Mat & Devices MOE, Shanghai, Peoples R China
[2] Univ Queensland, Ctr Theoret & Computat Mol Sci, Australian Inst Bioengn & Nanotechnol, Brisbane, Qld, Australia
[3] Chinese Acad Sci, Joint Lab Graphene Mat & Applicat, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai, Peoples R China
[4] Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing, Peoples R China
[5] Ningbo Univ, Sch Phys Sci & Technol, Dept Microelect Sci & Engn, Ningbo, Peoples R China
[6] Beijing Inst Technol, Sch Informat & Elect, MIIT Key Lab Low Dimens Quantum Struct & Devices, Beijing, Peoples R China
[7] Soochow Univ, Inst Funct Nano & Soft Mat FUNSOM, Jiangsu Key Lab Carbon Based Funct Mat & Devices, Suzhou, Peoples R China
[8] Macau Univ Sci & Technol, Macao Inst Mat Sci & Engn, Macau, Peoples R China
[9] Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX USA
[10] Univ Queensland, Sch Chem & Mol Biosci, Brisbane, Qld, Australia
基金
中国国家自然科学基金; 澳大利亚研究理事会;
关键词
DOPED GRAPHENE; CARBON; TRANSPORT; BORON; SEMICONDUCTORS; FABRICATION; VALLEY; STATES; MOS2;
D O I
10.1038/s41928-021-00602-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Carbon materials such as graphene are of potential use in the development of electronic devices because of properties such as high mechanical strength and electrical and thermal conductivity. However, technical challenges, including difficulties in generating and modulating bandgaps, have limited the application of such materials. Here we show that the bandgaps of bilayers of two-dimensional C3N can be engineered by controlling the stacking order or applying an electric field. AA' stacked C3N bilayers are found to have a smaller bandgap (0.30 eV) than AB' stacked bilayers (0.89 eV), and both bandgaps are lower than that of monolayer C3N (1.23 eV). The larger bandgap reduction observed in AA' stacked bilayers, compared with AB' stacked bilayers, is attributed to the greater p(z)-orbital overlap. By applying an electric field of similar to 1.4 V nm(-1), a bandgap modulation of around 0.6 eV can be achieved in the AB' structure. We also show that the C3N bilayers can offer controllable on/off ratios, high carrier mobilities and photoelectric detection capabilities.
引用
收藏
页码:486 / 494
页数:9
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