Behaviors of Self-Assembled Diblock Copolymer with Pendant Photosensitive Azobenzene Segments

被引:24
|
作者
Liu, Jui-Hsiang [1 ]
Chiu, Yi-Hong [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Chem Engn, Tainan 70101, Taiwan
关键词
AFM; annealing; atom transfer radical polymerization (ATRP); block copolymers; diblock copolymers; isomer/isomerization; polymers; self-assembly; thin films; MICROPHASE SEPARATION; BLOCK-COPOLYMERS; AZO-POLYMERS; NANOSTRUCTURE; FABRICATION; MOIETIES; FILMS;
D O I
10.1002/pola.23871
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
A novel monomer, ethyl 4-[4-(11-methacryloyloxyundecyloxy)phenyl azobenzoyl-oxyl] benzoate, containing a photoisomerizable N=N group was synthesized. The monomer was further diblock copolymerized with methyl methacrylate. Amphiphilic diblock copolymer poly(methyl methacrylate-block-ethyl 4-[4-(11-methacryloyloxyundecyloxy)phenyl azobenzoyl-oxyl] benzoate (PMMA-b-PAzoMA) was synthesized using atom transfer radical polymerization. The reverse micelles with spherical construction were obtained with 2 wt % of the diblock copolymer in a THF/H2O mixture of 1:2. Under alternating UV and visible light illumination, reversible changes in micellar structure between sphere and rod-like particles took place as a result of the reversible E-Z photoisomerization of azobenzene segments in PMMA-b-PAzoMA. Microphase separation of the amphiphilic diblock copolymer in thin films was achieved through thermal and solvent aligning methods. The microphases of the annealed thin films were investigated using atom force microscopy topology and scanning electron microscopy analyses. (C) 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 1142-1148, 2010
引用
收藏
页码:1142 / 1148
页数:7
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