High-power impulse magnetron sputtering and its applications

被引：43
作者：
Ehiasarian, Arutiun P. [1 ]
机构：
[1] Sheffield Hallam Univ, Nanotechnol Ctr PVD Res, Mat & Engn Res Inst, Sheffield S1 1WB, S Yorkshire, England
来源：
PURE AND APPLIED CHEMISTRY | 2010年 / 82卷 / 06期
基金：
英国工程与自然科学研究理事会;
关键词：
coating adhesion; high-density microstructure films; high-power impulse magnetron sputtering; local epitaxial growth; physical vapor deposition; COATINGS; DEPOSITION; DENSITIES; DISCHARGE;
D O I：
10.1351/PAC-CON-09-10-43
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm(-2) on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic, and optical coatings.
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收藏
页码：1247 / 1258
页数：12
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