Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

被引：86

作者：

Cochran, Elizabeth A. ^{[1
]}

Woods, Keenan N. ^{[1
]}

Johnson, Darren W. ^{[1
]}

Page, Catherine J. ^{[1
]}

Boettcher, Shannon W. ^{[1
]}

机构：

[1] Univ Oregon, Ctr Sustainable Mat Chem, Mat Sci Inst, Dept Chem & Biochem, Eugene, OR 97403 USA

来源：

JOURNAL OF MATERIALS CHEMISTRY A | 2019年 / 7卷 / 42期

关键词：

LOW-TEMPERATURE FABRICATION; NONUNIFORM COMPOSITION PROFILES; MOLECULAR-ORBITAL CALCULATIONS; ATOMIC LAYER DEPOSITION; SOL-GEL CHEMISTRY; THERMAL-DECOMPOSITION; AQUEOUS-SOLUTION; COMBUSTION SYNTHESIS; CRYSTAL-STRUCTURE; YTTRIUM-OXIDE;

D O I：

10.1039/c9ta07727h

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Metal-oxide thin films are used extensively in electronic and energy applications. Solution processing offers a potentially scalable and inexpensive deposition method to expand the applications of metal-oxide films and to complement vacuum-deposition techniques. Among precursors for solution deposition, metal nitrates stand out for their ability to form high-quality metal-oxide thin films. This review focuses on unique aspects of metal-nitrate chemistry that have been exploited to advance the development of solution-processed thin films. We discuss the solid-state bulk, solution, and thin-film chemical reactions involving metal nitrates and illustrate how the resulting metal-oxide thin-film properties depend on the entire reaction pathway. To conclude, we offer perspective as to how understanding the chemistry of film formation from metal-nitrate precursors is useful for addressing the primary drivers for industrial manufacturing of solution-processed metal-oxide thin films.

引用

页码：24124 / 24149

页数：26

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