3-D design and analysis of functional NEMS-gate MOSFETs and SETs

被引:21
作者
Pruvost, Benjamin [1 ]
Mizuta, Hiroshi
Oda, Shunri
机构
[1] Tokyo Inst Technol, Quantum Nanoelect Res Ctr, Tokyo 1528552, Japan
[2] Tokyo Inst Technol, Dept Phys Elect, Tokyo 15285552, Japan
[3] Japan Sci & Technol, SORST, Tokyo 15285552, Japan
关键词
analytical modeling; metal-oxide-semiconductor field effect transistor (MOSFET); movable gate; nanoelectromechanical system (NEMS); single-electron transistor (SET); 3-D modeling;
D O I
10.1109/TNANO.2007.891825
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nanoelectromechanical system (NEMS)-gate metal-oxide-semiconductor field effect transistor (MOSFET) and single-electron transistor (SET) structures are investigated by combining 3-D design and SPICE simulation. First, the metal gate is simulated by using a 3-D simulator, which enables to design realistic 3-D device structures, and its movement is studied for different design parameters. It is demonstrated that a low stiffness design of the structure is essential for a low-voltage actuation. Results are compared with theoretical numerical simulation and a tunable capacitor model is then embedded in a SPICE simulator and coupled either with a transistor model for MOS-NEMS or with a newly developed SET analytical model for SET-NEMS. It is shown that the use of NEMS membrane can add new functionalities to conventional MOSFET and SET, such as very abrupt switching of the current, which can break theoretical limits of MOSFET, or modulation of Coulomb oscillations governing SET characteristics.
引用
收藏
页码:218 / 224
页数:7
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