Characteristics of the low energy photoluminescence in μc-Si films

被引:15
作者
Yue, GZ [1 ]
Han, DX
McNeil, LE
Wang, Q
机构
[1] Univ N Carolina, Dept Phys & Astron, Chapel Hill, NC 27599 USA
[2] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1063/1.1289785
中图分类号
O59 [应用物理学];
学科分类号
摘要
The temperature and excitation-intensity dependence of the similar to 0.9 eV photoluminescence (PL) band has been studied in several microcrystalline silicon (mu c-Si) films with varied crystallinity. When the measurement temperature is increased from 15 to 180 K, the PL peak energy redshifts from 1.0 to 0.83 eV. The PL quenching of the intensity follows a model of carrier thermalization in an exponential band tail with a width of similar to 20 meV. The total PL intensity (I-PL) as a function of excitation intensity (I-ex) obeys a power law of I(PL)proportional to I-ex(gamma), where gamma approximate to 0.65 or 1 for high or low excitation intensity, respectively. The experimental results suggest that the similar to 0.9 eV PL band originates from radiative tail-to-tail transitions in the grain-boundary region in mu c-Si. (C) 2000 American Institute of Physics. [S0021-8979(00)06919-X].
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页码:4904 / 4906
页数:3
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