Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

被引：1

作者：

Koukharenko, Elena ^{[1
]}

Kuleshova, Jekaterina ^{[2
]}

Fowler, Marcel ^{[3
]}

Kok, Stephen L. ^{[1
]}

Tudor, Michael J. ^{[1
]}

Beeby, Stephen P. ^{[1
]}

Nandhakumar, Iris ^{[2
]}

White, Neil M. ^{[1
]}

机构：

[1] Univ Southampton, Sch Elect & Comp Sci, Southampton SO17 1BJ, Hants, England

[2] Univ Southampton, Sch Chem, Southampton SO17 1BJ, Hants, England

[3] Univ Southampton, Sch Phys & Astron, Southampton SO17 1BJ, Hants, England

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 06期

基金：

英国工程与自然科学研究理事会;

关键词：

LITHOGRAPHY;

D O I：

10.1143/JJAP.49.06GE07

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet (DUV) cross linking polymerisation prior to the ion-track irradiation. DUV exposure times and post exposure hardbake conditions are crucial factors for achieving high aspect ratio structures. Exposure doses of 6600 mJ/cm(2) with post exposure hardbake at 180 degrees C for 90 s gave promising preliminary results for high aspect ratio nanotemplates using thick layer of PMMA 950 photoresist. (C) 2010 The Japan Society of Applied Physics

引用

页码：06GE071 / 06GE072

页数：2

共 8 条

[1] Ion beam lithography using single ions [J].

Alves, A. ;

Reichart, P. ;

Siegele, R. ;

Johnston, P. N. ;

Jamieson, D. N. .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 249 :730-733

[2]

BHUSHAN B, 2007, HDB NANOTECHNOLOGY, P7

[3] Surface tracks by MeV C60 impacts on mica and PMMA [J].

Dobeli, M ;

Ames, F ;

Musil, CR ;

Scandella, L ;

Suter, M ;

Synal, HA .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 143 (04) :503-512

[4] Novel Ti-base nanostructure-dendrite composite with enhanced plasticity [J].

He, G ;

Eckert, J ;

Löser, W ;

Schultz, L .

NATURE MATERIALS, 2003, 2 (01) :33-37

[5] Towards a nanostructured thermoelectric generator using ion-track lithography [J].

Koukharenko, E. ;

Li, X. ;

Nandhakumar, I. ;

Frety, N. ;

Beeby, S. P. ;

Cox, D. ;

Tudor, M. J. ;

Schiedt, B. ;

Trautmann, C. ;

Bertsch, A. ;

White, N. M. .

JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2008, 18 (10)

[6] One dimensional nanostructured materials [J].

Kuchibhatla, Satyanarayana V. N. T. ;

Karakoti, A. S. ;

Bera, Debasis ;

Seal, S. .

PROGRESS IN MATERIALS SCIENCE, 2007, 52 (05) :699-913

[7] New developments on the Surrey microbeam applications to lithography [J].

Mistry, P ;

Gornez-Morilla, I ;

Grime, GW ;

Webb, R ;

Jeynes, C ;

Gwilliam, R ;

Cansell, A ;

Merchant, M ;

Kirkby, KJ .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 231 :428-432

[8]

MOLARES TME, 2004, NANOTECHNOLOGY, V15, pS201

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