Solid phase epitaxial regrowth of (001) anatase titanium dioxide

被引:4
作者
Barlaz, David Eitan [1 ]
Seebauer, Edmund G. [1 ]
机构
[1] Univ Illinois, Dept Chem & Biomol Engn, 600 S Mathews Ave, Urbana, IL 61801 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2016年 / 34卷 / 02期
基金
美国国家科学基金会;
关键词
IMPLANTED TIO2; STABILIZATION; SILICON; LOCATION; GROWTH; OXIDES; LAYERS;
D O I
10.1116/1.4941446
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The growing interest in metal oxide based semiconductor technologies has driven the need to produce high quality epitaxial films of one metal oxide upon another. Largely unrecognized in synthetic efforts is that some metal oxides offer strongly polar surfaces and interfaces that require electrostatic stabilization to avoid a physically implausible divergence in the potential. The present work examines these issues for epitaxial growth of anatase TiO2 on strontium titanate (001). Solid phase epitaxial regrowth yields only the (001) facet, while direct crystalline growth by atomic layer deposition yields both the (112) and (001). The presence of amorphous TiO2 during regrowth may provide preferential stabilization for formation of the (001) facet. (C) 2016 American Vacuum Society.
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页数:5
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