Condensation coefficients in plasma sputtering deposition

被引：5

作者：

Brault, Pascal ^{[1
]}

Thomann, Anne-Lise ^{[1
]}

Rozenbaum, Jean-Philippe ^{[1
]}

机构：

[1] Univ Orleans, Grp Rech Energet Milieux Ionises, CNRS, UMR6606, F-45067 Orleans 2, France

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2007年 / 40卷 / 07期

关键词：

D O I：

10.1088/0022-3727/40/7/039

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Optical emission spectroscopy and Rutherford backscattering spectrometry are combined to determine condensation coefficients for plasma sputtering deposition. The method is applied for palladium deposition onto various substrates and condensation coefficients are found to lie between 0.4 and 0.9.

引用

页码：2121 / 2123

页数：3

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