Effects of preferred orientation on electrical properties of Mn1.56Co0.96Ni0.48O4 ± δ spinel films

被引:23
作者
Kong, Wenwen [1 ,2 ,3 ]
Bu, Haijun [3 ]
Gao, Bo [1 ]
Chen, Long [1 ,2 ,3 ]
Cheng, Fei [1 ,2 ]
Zhao, Pengjun [1 ,2 ]
Ji, Guang [3 ]
Chang, Aimin [1 ]
Jiang, Chunping [1 ,3 ]
机构
[1] Xinjiang Tech Inst Phys & Chem CAS, Xinjiang Key Lab Elect Informat Mat & Devices, Key Lab Funct Mat & Devices Special Environm CAS, Urumqi 830011, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Peoples R China
基金
中国科学院西部之光基金; 中国国家自然科学基金;
关键词
Mn1.56Co0.96Ni0.48O4 (+/- delta); Thin film; Crystal structure; Electrical properties; OXYGEN PARTIAL-PRESSURE; THIN-FILMS; SERIES;
D O I
10.1016/j.matlet.2014.08.124
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mn1.56Co0.96Ni0.48O4 +/- delta thin films are fabricated by Pulsed Laser Deposition process at different oxygen partial pressure. The X-ray diffraction shows that the preferential orientation of the films changes from (4 0 0) plane to (1 1 3) as the oxygen pressure increases. The resistance of the (1 1 3)-oriented films is found to decrease compared to those of the (4 0 0)-oriented ones. Meanwhile, the activation energy E-a increases dramatically. A detailed X-ray photoemission spectroscopy study of the lattice oxygen content and Mn cation distribution is performed. The results reveal that higher oxygen partial pressure during deposition should be responsible for the preferred (1 1 3) plane growth and the greatly elevated amount of Mn3+ and Mn4+, which can result in significantly different electrical properties of Mn1.56Co0.96Ni0.48O4 (+/-) (delta) spinel films. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:36 / 40
页数:5
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