Atomically stepped glass surface formed by nanoimprint

被引:23
作者
Akita, Yasuyuki [1 ]
Watanabe, Takahiro [1 ]
Hara, Wakana [1 ]
Matsuda, Akifumi [1 ]
Yoshimoto, Mamoru [1 ]
机构
[1] Tokyo Inst Technol, Interdisciplinary Grad Sch Sci & Engn, Dept Innovated & Engineered Mat, Midori Ku, Yokohama, Kanagawa, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 12-16期
关键词
oxide glass nanoimprint; nanowave; imprint; oxide glass; sapphire;
D O I
10.1143/JJAP.46.L342
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated atomic-scale surface modifications of silicate glass by nanoimprint using an atomically stepped sapphire (alpha-A1(2)O(3) single crystal) plate as nanopattern mold. The sapphire mold had regularly arranged straight atomic steps, with uniform height and terrace width of about 0.2 and 80 nm, respectively. During pressing, vertical. positions of the sapphire mold and glass plate significantly affected the morphology of the imprinted glass surface. The nanopattern was transferred to the glass surface when the mold was set on the glass plate, while the nanowave pattern was formed on the glass surface when the glass plate was set on the mold.
引用
收藏
页码:L342 / L344
页数:3
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