Deposition of NiFe(200) and NiFe(111) textured films onto Si/SiO2 substrates by DC magnetron sputtering

被引：6

作者：

Dzhumaliev, A. S. ^{[1
,2
]}

Nikulin, Yu. V. ^{[1
,2
]}

Filimonov, Yu. A. ^{[1
,2
,3
]}

机构：

[1] Russian Acad Sci, Kotelnikov Inst Radio Engn & Elect, Saratov Branch, Ul Zelenaya 38, Saratov 410019, Russia

[2] Chernyshevsky Saratov State Univ, Ul Astrakhanskaya 83, Saratov 410012, Russia

[3] Gagarin State Tech Univ Saratov, Ul Politekhn Skaya 77, Saratov 410054, Russia

来源：

PHYSICS OF THE SOLID STATE | 2016年 / 58卷 / 05期

基金：

俄罗斯基础研究基金会;

关键词：

PERMALLOY-FILMS; THIN-FILMS; MAGNETORESISTANCE;

D O I：

10.1134/S1063783416050073

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The effect of substrate temperature T (sub) and bias voltage U (bias) on the texture of NiFe films with thickness d similar to 30-340 nm deposited by DC magnetron sputtering onto Si(111)/SiO2 substrates under working gas pressure similar to 0.2 Pa has been investigated. It has been demonstrated that films grown at room substrate temperature have the (111) texture that is refined under a negative bias voltage. The deposition of films onto a grounded (U (bias) similar to 0) substrate heated to T (sub) similar to 440-640 K results in the formation of textured NiFe(200) films.

引用

页码：1053 / 1057

页数：5

共 21 条

[1] The structure and surface energy of Ni80Fe20 thin films [J].