Single-Atom Catalysts Designed and Prepared by the Atomic Layer Deposition Technique

被引:212
作者
Fonseca, Javier [2 ]
Lu, Junling [1 ]
机构
[1] Univ Sci & Technol China, iChEM, Hefei Natl Lab Phys Sci Microscale, Dept Chem Phys, Hefei 230026, Anhui, Peoples R China
[2] Northeastern Univ, Dept Chem Engn, Nanomat Lab Catalysis & Adv Separat, Boston, MA 02115 USA
基金
中国国家自然科学基金;
关键词
atomic layer deposition; single-atom catalysts; single-atom alloys; Ostwald ripening; catalysis; WATER-GAS SHIFT; METAL-SUPPORT INTERACTIONS; NITROGEN-DOPED GRAPHENE; CORE-SHELL NANOPARTICLES; UP PRECISE SYNTHESIS; IN-SITU; ACTIVE-SITES; THIN-FILMS; SELECTIVE HYDROGENATION; HETEROGENEOUS CATALYSIS;
D O I
10.1021/acscatal.1c01200
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts (SACs) with atomic-level control. The major aim of this Review is to systematize our knowledge of the synthesis of SACs by ALD and thus help the reader to extract fundamental principles for the further development of this field. Studies of metal dimers prepared by ALD are also explored. In addition, we describe the fundamental mechanism of ALD, discuss the effects of size, shape, and metal-support interactions for catalysts, and summarize the characterization techniques and preparation methods of SACs. At the end of this Review, we present an outlook of the challenges and opportunities of the synthesis of SACs by ALD.
引用
收藏
页码:7018 / 7059
页数:42
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