Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations

被引：13

作者：

Rommel, M. ^{[1
]}

Jambreck, J. D. ^{[1
]}

Ebm, C. ^{[2
]}

Platzgummer, E. ^{[2
]}

Bauer, A. J. ^{[1
]}

Frey, L. ^{[1
,3
]}

机构：

[1] IISB, Fraunhofer Inst Integrated Syst & Device Technol, D-91058 Erlangen, Germany

[2] IMS Nanofabricat AG, A-1020 Vienna, Austria

[3] Univ Erlangen Nurnberg, Chair Elect Devices, D-91058 Erlangen, Germany

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 5-8期

关键词：

Focused ion beam; FIB; FIB patterning; Patterning simulation; Patterning strategy;

D O I：

10.1016/j.mee.2009.10.054

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Today's focused ion beam (FIB) systems enable the fast and flexible fabrication of 3D structures with dimensions well below 100 nm. Due to secondary effects like redeposition of sputtered material, however, the fabrication of a targeted shape of the structure is not simple at all. In this work, the influence of the patterning strategy during the sputtering on the shape of a 3D structure with rotational symmetry is studied. Highly different shapes of 3D structures are achieved only due to different rastering strategies or duration times of the ion beam at each raster pixel. The final structure shape can be properly modeled with lonShaper(R) simulations. These results clearly prove that the selection of the patterning strategy is the key for appropriate FIB processing of 3D structures. Besides, it is shown that unconventional patterning strategies might enable new types of 3D shapes. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1566 / 1568

页数：3

共 7 条

[1]

EBM C, J VAC SCI B IN PRESS

[2] Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling [J].