A Millimeter-Wave Field-Effect Transistor Based on a Pseudomorphic Heterostructure with an Additional Potential Barrier

被引:0
作者
Bogdanov, S. A. [1 ]
Bakarov, A. K. [2 ]
Zhuravlev, K. S. [2 ]
Lapin, V. G. [1 ]
Lukashin, V. M. [1 ]
Pashkovskii, A. B. [1 ]
Rogachev, I. A. [1 ]
Tereshkin, E. V. [1 ]
Shcherbakov, S. V. [1 ]
机构
[1] AO Shokin NPP Istok, Fryazino 141190, Moscow Oblast, Russia
[2] Russian Acad Sci, Rzhanov Inst Semicond Phys, Siberian Branch, Novosibirsk 630090, Russia
关键词
additional potential barriers; field-effect transistor; gain; ELECTRON-DRIFT VELOCITY; POWER; GAN; TRANSPORT;
D O I
10.1134/S1063785021040052
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the results of investigations of the millimeter-wave field-effect transistors with a 0.14-mu m T-shaped gate with pseudomorphic Al0.3Ga0.7As-In0.22Ga0.78As-Al0.3Ga0.7As heterostructures with additional potential barriers based on a two-sided donor-acceptor channel doping. At a frequency of 40 GHz in a wide gate voltage range, the maximum stable gain of more than 15 dB has been obtained. The maximum oscillation frequency of the device is about 250 GHz, the open-channel specific current density is about 0.7 A/mm, and the gate-drain breakdown voltage is 22-31 V for different versions.
引用
收藏
页码:329 / 332
页数:4
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