Temperature dependence of visible photoluminescence from PECVD nanocrystallites embedded in amorphous silicon films

被引:5
|
作者
Tong, S [1 ]
Liu, XN [1 ]
Gao, T [1 ]
Bao, XM [1 ]
Chang, Y [1 ]
Shen, WZ [1 ]
Tang, WG [1 ]
机构
[1] ACAD SINICA, SHANGHAI INST TECH PHYS, SHANGHAI 200083, PEOPLES R CHINA
关键词
nanostructures; semiconductor; recombination and trapping; luminescence;
D O I
10.1016/S0038-1098(97)00391-8
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The temperature dependence of visible range photoluminescence (PL) properties of nanocrystallites embedded in silicon films deposited at the substrate temperature T-s= 50-150 degrees C by PECVD method was studied. It was found that there are many differences between them and that of the near-infrared range PL in ordinary a-Si:H films. Combining with the results of photo-absorption studies of these nanocrystalline samples, we discussed the mechanism of their visible range FL. We suggest that the light excitation occurs in both the nanocrystallites core and their surface regions; however, the radiative recombination can only occur between the electrons and holes in the localized band tail states of the crystallite surface regions, which are more disordered than ordinary a-Si:H with their defect states extending more deeply into the band gap. (C) 1997 Elsevier Science Ltd.
引用
收藏
页码:603 / 607
页数:5
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