Enhanced p-Channel Metal-Oxide-Semiconductor Field-Effect Transistor Charge Pump for Low-Voltage Applications

被引:3
|
作者
Hsu, Chien-Pin [1 ]
Wu, Hai-Ming [1 ]
Lin, Hongchin [1 ]
机构
[1] Natl Chung Hsing Univ, Dept Elect Engn, Taichung 402, Taiwan
关键词
EFFICIENCY; CIRCUITS;
D O I
10.1143/JJAP.49.04DE16
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, a power-efficient two-phase p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET) charge pump with two auxiliary clocks to boost the gate biases of the switching transistors is proposed for low-voltage applications. It can increase overdrive voltages of the switching transistors, preserve low voltage drops within the transistors, and work well at a reduced supply voltage. Simulation results show that the proposed two-stage charge pump improves the voltage gain by more than 30% for 0.35 mu m complementary metal-oxide-semiconductor (CMOS) field-effect transistor (FET) technology and improves the maximum power efficiency by 40% for 0.18 mu m CMOS technology in comparison with Racape and Daga's charge pump. Measurement results show that the voltage gains of the proposed two-stage charge pump are more than 95.7 and 92% at supply voltages higher than 1.4 and 0.7 V for 0.35 and 0.18 mu m CMOS technologies, respectively. A compact model of power efficiency for the proposed charge pump is derived and verified by simulations and measurements. Results show that the power efficiency can be approximately 60% at low supply voltages. (C) 2010 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [31] LOW-TEMPERATURE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR PREAMPLIFIER
    IMAI, J
    FLORES, R
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (10): : 3024 - 3025
  • [32] A spin metal-oxide-semiconductor field-effect transistor (spin MOSIFET) with a ferromagnetic semiconductor for the channel
    Sugahara, S
    Tanaka, M
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (10)
  • [33] Metal-oxide-semiconductor field-effect transistor junction requirements
    Duane, Michael
    Lynch, William
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1998, 16 (01):
  • [34] Shot noise model of the short channel metal-oxide-semiconductor field-effect transistor
    Zhang Meng
    Yao Ruo-He
    Liu Yu-Rong
    Geng Kui-Wei
    ACTA PHYSICA SINICA, 2020, 69 (17)
  • [35] A METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH A 20-NM CHANNEL LENGTH
    HARTSTEIN, A
    ALBERT, NF
    BRIGHT, AA
    KAPLAN, SB
    ROBINSON, B
    TORNELLO, JA
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (05) : 2493 - 2495
  • [37] A channel thermal noise model of nanoscaled metal-oxide-semiconductor field-effect transistor
    Zhang Meng
    Yao Ruo-He
    Liu Yu-Rong
    ACTA PHYSICA SINICA, 2020, 69 (05)
  • [38] GaN metal-oxide-semiconductor field-effect transistor inversion channel mobility modeling
    Perez-Tomas, A.
    Placidi, M.
    Perpina, X.
    Constant, A.
    Godignon, P.
    Jorda, X.
    Brosselard, P.
    Millan, J.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (11)
  • [39] DEGRADATION PHENOMENON UNDER LOW DRAIN VOLTAGE STRESS IN P-CHANNEL METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT-TRANSISTORS
    MORII, T
    MURAI, R
    URAOKA, Y
    TSUJI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B): : 678 - 682
  • [40] Studies on metal-oxide-semiconductor field-effect transistor low-frequency noise for electrometer applications
    Clement, Nicolas
    Inokawa, Hiroshi
    Ono, Yukinori
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (4 B): : 3606 - 3608