Electron holography on HfO2/HfO2-x bilayer structures with multilevel resistive switching properties

被引:31
作者
Niu, G. [1 ,2 ,3 ]
Schubert, M. A. [3 ]
Sharath, S. U. [4 ]
Zaumseil, P. [3 ]
Vogel, S. [4 ]
Wenger, C. [3 ]
Hildebrandt, E. [4 ]
Bhupathi, S. [3 ]
Perez, E. [3 ]
Alff, L. [4 ]
Lehmann, M. [5 ]
Schroeder, T. [3 ,6 ]
Niermann, T. [5 ]
机构
[1] Xi An Jiao Tong Univ, Elect Mat Res Lab, Key Lab, Minist Educ, Xian 710049, Peoples R China
[2] Xi An Jiao Tong Univ, Int Ctr Dielect Res, Xian 710049, Peoples R China
[3] IHP, Technol Pk 25, D-15236 Frankfurt, Oder, Germany
[4] Tech Univ Darmstadt, Inst Mat Sci, D-64287 Darmstadt, Germany
[5] Tech Univ Berlin, Inst Opt & Atomare Phys, Str 17,Juni 135, D-10623 Berlin, Germany
[6] BTU Cottbus Senftenberg, Konrad Zuse Str 1, D-03046 Cottbus, Germany
关键词
RRAM; electron holography; HfO2; resistive switching; multi-level; CONDUCTIVE FILAMENT; MEMORY; DEVICES;
D O I
10.1088/1361-6528/aa6cd9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Unveiling the physical nature of the oxygen-deficient conductive filaments (CFs) that are responsible for the resistive switching of the HfO2-based resistive random access memory (RRAM) devices represents a challenging task due to the oxygen vacancy related defect nature and nanometer size of the CFs. As a first important step to this goal, we demonstrate in this work direct visualization and a study of physico-chemical properties of oxygen-deficient amorphous HfO2-x by carrying out transmission electron microscopy electron holography as well as energy dispersive x-ray spectroscopy on HfO2/HfO2-x bilayer heterostructures, which are realized by reactive molecular beam epitaxy. Furthermore, compared to single layer devices, Pt/HfO2/HfO2-x/TiN bilayer devices show enhanced resistive switching characteristics with multilevel behavior, indicating their potential as electronic synapses in future neuromorphic computing applications.
引用
收藏
页数:7
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