Electrical measurements on p+-p--p+ homoepitaxial diamond capacitors

被引:6
作者
Inushima, T [1 ]
Matsushita, T
Mamin, RF
Ohya, S
Shiomi, H
机构
[1] Tokai Univ, Dept Commun Engn, Hiratsuka, Kanagawa 2591292, Japan
[2] Kanagawa Ind Technol Res Inst, Ebina 2430435, Japan
[3] Sumitomo Elect Ind Ltd, Itami Res Lab, Itami, Hyogo 6640016, Japan
[4] Russian Acad Sci, Kazan Phys Tech Inst, Kazan 420029, Russia
关键词
D O I
10.1063/1.1289270
中图分类号
O59 [应用物理学];
学科分类号
摘要
Conductance versus voltage and capacitance versus voltage (C-V) characteristics are investigated for p(+)-p(-)-p(+) capacitors over a temperature range of 40-300 K, where the p(+) layer is heavily doped homoepitaxial diamond and has impurity-band conduction and the p(-) layer is slightly doped with valence-band conduction. Above 200 K, the capacitors behave like a semiconductor-insulator-semiconductor diode with interface barrier height of about 0.07 eV. The C-V curve agrees closely with the standard theory of semiconductor-insulator-semiconductor structure and shows formation of the deletion layer at the p(+) layer on the interface. The Cole-Cole plot of conductance versus susceptance reveals that there is a virtual trap level in the p(-) layer which is located about 0.06 eV above the valence band. (C) 2000 American Institute of Physics. [S0003-6951(00)01334-6].
引用
收藏
页码:1173 / 1175
页数:3
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