Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching

被引：14

作者：

Demidov, E. V. ^{[1
]}

Komarov, V. A. ^{[1
]}

Krushelnitckii, A. N. ^{[1
]}

Suslov, A. V. ^{[1
]}

机构：

[1] Herzen State Pedag Univ Russia, St Petersburg 191186, Russia

来源：

SEMICONDUCTORS | 2017年 / 51卷 / 07期

基金：

俄罗斯基础研究基金会;

关键词：

TOPOLOGICAL INSULATORS;

D O I：

10.1134/S1063782617070065

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.

引用

页码：840 / 842

页数：3

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