Vapor fluxes on the apical droplet during nanowire growth by molecular beam epitaxy

被引：73

作者：

Glas, Frank ^{[1
]}

机构：

[1] CNRS Lab Photon & Nanostruct, F-91460 Marcoussis, France

来源：

PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2010年 / 247卷 / 02期

关键词：

MECHANISM; GAAS;

D O I：

10.1002/pssb.200945456

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

During nanowire growth by the vapor-liquid-solid method, part of the atoms incorporated in the nanowire originate from the direct impingement of a vapor beam on the droplet sitting at the top of the nanowire. For a given incident directional flux, as pertains to molecular beam epitaxy, we calculate the variations of this contribution as a function of the beam incidence angle and of the droplet contact angle. This provides a quantitative evaluation of a major contribution to the supply of atoms to the growing nanowire, which can be directly incorporated in growth models. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：254 / 258

页数：5

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