Evaluation of the crystalline quality of β-Ga2O3 films by optical absorption measurements

被引:53
作者
Takakura, K. [1 ]
Koga, D. [1 ]
Ohyama, H. [1 ]
Rafi, J. M. [2 ]
Kayamoto, Y. [3 ]
Shibuya, M. [4 ]
Yamamoto, H. [5 ]
Vanhellemont, J. [6 ]
机构
[1] Kumamoto Natl Coll Technol, Kumamoto 8621102, Japan
[2] CSIC, CNM, Barcelona 08193, Spain
[3] Koto Mfg Co Ltd, Kumamoto 8614211, Japan
[4] Japan Gas Chem, Kumamoto 8620932, Japan
[5] Techno Design Co Ltd, Kumamoto 8612401, Japan
[6] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium
关键词
Gallium oxide; Transparent electrode; Optical absorption spectra; THIN-FILMS;
D O I
10.1016/j.physb.2009.08.167
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Si doped beta-Ga2O3 films were grown on Si substrate by RF magnetron sputtering. The Si concentration varied from 0% to 50%. After the deposition of the amorphous Ga2O3 on the substrate, thermal annealing at 600 degrees C was performed in nitrogen ambient. Polycrystalline beta-Ga2O3 films were grown on Si or quartz substrates; however, other mixed phases of Si, Ga and O were not observed. From the measurement of optical absorption coefficient, it is concluded that the beta-Ga2O3 energy gap increases with increasing Si concentration in the deposited film. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4854 / 4857
页数:4
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