Influence of nitrate/nitrite on the degradation and transformation of triclosan in the UV based disinfection

This study investigated the influence of nitrate/nitrite on the degradation and transformation pathway of tri-closan (TCS) in UV, UV/peracetic acid (PAA) and UV/HClO processes. The results indicated that the function of nitrate/nitrite significantly depended on the UV source and wavelength, especially nitrate. Generally, the presence of nitrate decreased the direct photo-degradation of TCS in the UV based disinfection. In the LED-UV and LED-UV/HClO processes, the presence of nitrate improved the radical oxidation, and transformation pathway of TCS was varied accordingly. However, nitrate more played a role of photo-competitor in the UV/PAA process, and the reactive nitrogen species (RNS) was difficult to participant in the degradation of TCS due to low redox potential. Compared to nitrate, the presence of nitrite decreased the degradation of TCS in three different UV based disinfection processes. Under UV irradiation, nitrite primarily acted as an irradiation competitor and radical scavenger. Thus, the indirect photo-degradation of TCS was reduced. Noticeably, nitrate/nitrite were the improtant precersors of nitrogenous products in the UV base disinfection. Many new nitrogenous products were identified. But RNS preferentially reacted with the intermediates by -NO2 addition compared to directly reacted with TCS.