Short-Circuit Degradation of 10-kV 10-A SiC MOSFET

被引:55
作者
Eni, Emanuel-Petre [1 ]
Beczkowski, Szymon [1 ]
Munk-Nielsen, Stig [1 ]
Kerekes, Tamas [1 ]
Teodorescu, Remus [1 ]
Juluri, Raghavendra Rao [2 ]
Julsgaard, Brian [3 ,4 ]
VanBrunt, Edward [5 ]
Hull, Brett [5 ]
Sabri, Shadi [5 ]
Grider, David [5 ]
Uhrenfeldt, Christian [1 ]
机构
[1] Aalborg Univ, Dept Energy Technol, DK-9220 Aalborg, Denmark
[2] Aarhus Univ, Interdisciplinary Nanosci Ctr, DK-8000 Aarhus, Denmark
[3] Aarhus Univ, Dept Phys & Astron, DK-8000 Aarhus, Denmark
[4] Aarhus Univ, Interdisciplinary Nanosci Ctr, DK-8000 Aarhus, Denmark
[5] Cree Co, Wolfspeed, Durham, NC 27709 USA
关键词
Degradation; high voltage; short circuit; SiC MOSFET; PERFORMANCE; RELIABILITY; ROBUSTNESS; TECHNOLOGY;
D O I
10.1109/TPEL.2017.2657754
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The short-circuit behavior of power devices is highly relevant for converter design and fault protection. In this paper, the degradation during short circuit of a 10-kV 10-A 4H-SiC MOSFET is investigated at 6 kV dc-link voltage. The study aims to present the behavior of the device during short-circuit transients as it sustains increasing short-circuit pulses during its lifetime. As the short-circuit pulse length increases, degradation of the device can be observed in periodically performed characterizations. The initial degradation seems to be associated with the channel region, and continuous stressing leads to an overall increase in device on-state resistance at the end of the degradation study. Thermal simulation shows that the surface aluminum metalization reached its melting temperature and the top part of the device reaches temperatures above the rated junction temperature. Scanning electron microscope investigation shows aluminum reconstruction and cavities at the contact interface between the aluminum surface metalization and source contacts.
引用
收藏
页码:9342 / 9354
页数:13
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