Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin

被引:59
作者
Lee, H
Jung, GY
机构
[1] Korea Univ, Div Mat Sci & Engn, Seoul 136701, South Korea
[2] Hewlett Packard Labs, QSRI Grp, Palo Alto, CA USA
关键词
thermal curing nano-imprinting lithography; zero residual layer; thermal curing resin; self-assembled monolayer; pressurized chamber type imprinting system; high fidelity pattern transfer;
D O I
10.1016/j.mee.2004.10.004
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally cut-able monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 degreesC) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:168 / 174
页数:7
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