Al2O3 coatings for 193nm:: A nonlinearly absorbing material

被引:1
作者
Apel, O [1 ]
Mann, K [1 ]
机构
[1] Laser Lab Gottingen EV, D-37077 Gottingen, Germany
来源
OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2 | 2000年 / 4000卷
关键词
DUV; 193nm; oxide coatings; absorption; Al2O3; nonlinear absorption; conditioning;
D O I
10.1117/12.388975
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
New absorption measurements for aluminum oxide optical coatings at 193nm are presented. Apart from the strong linear absorption at this wavelength the data indicate a nonlinear absorption within the thin dielectric layer which increases nonlinearly with the layer thickness. By varying the layer thickness, the intrinsic contribution of the layer material to the overall absorption was separated from the contribution of the substrate and the interface. In addition, the conditioning behaviour of the coatings was examined. A strong long term conditioning in the linear absorption was found for Al2O3 containing systems. Comparing the absorption and conditioning behaviour of the single layers and a high-reflective system, we can show that the absorption properties of the HR-system are determined by its Al2O3 layers.
引用
收藏
页码:1383 / 1389
页数:7
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