Tunable MEMS volume capacitors for high voltage applications

被引:5
作者
Etxeberria, J. A. [1 ]
Gracia, F. J. [1 ]
机构
[1] Univ Navarra, CEIT & TECNUN, San Sebastian 20018, Spain
关键词
power MEMS; tunable capacitor; bulk micromachining; high Q;
D O I
10.1016/j.mee.2007.01.063
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports the design, fabrication and electrical characterization of MEMS tunable volume capacitors to be used as voltage controlled devices in tuning telecommunication circuits. A novel fabrication process to obtain parallel plate metallic capacitors based on deep reactive ion etching (DRIE) bulk micromachining techniques have been developed. Devices of three different electrode areas have been fabricated and designed and the influence of the area in the main characteristics of the MEMS capacitors established. The interaction of the DC tuning voltage and AC signal and their influence on the tuning behavior has been analyzed and the top operation limits evaluated. The obtained results make this kind of MEMS tunable metallic capacitors appropriate candidates for its use in the new power MEMS scenario. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1393 / 1397
页数:5
相关论文
共 6 条
  • [1] A high Q, large tuning range MEMS capacitor for RF filter systems
    Borwick, RL
    Stupar, PA
    DeNatale, J
    Anderson, R
    Tsai, C
    Garrett, K
    Erlandson, R
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 2003, 103 (1-2) : 33 - 41
  • [2] High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining
    Fritschi, R
    Frédérico, S
    Hibert, C
    Flückiger, P
    Renaud, P
    Tsamados, D
    Boussey, J
    Chovet, A
    Ng, RKM
    Udrea, F
    Curty, JP
    Dehollain, C
    Declercq, M
    Ionescu, AM
    [J]. MICROELECTRONIC ENGINEERING, 2004, 73-4 : 447 - 451
  • [3] Microelectromechanical capacitors for RF applications
    Nieminen, H
    Ermolov, V
    Nybergh, K
    Silanto, S
    Ryhänen, T
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2002, 12 (02) : 177 - 186
  • [4] Characterization, modelling and performance evaluation of CMOS integrated multielectrode tunable capacitor (MTC)
    Olszewski, Z
    Hilll, M
    O'Mahony, C
    Duane, R
    Houlihan, R
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2005, 15 (07) : S122 - S131
  • [5] RF MEMS tunable capacitors with large tuning ratio
    Rijks, TGSM
    van Beek, JTM
    Steeneken, PG
    Ulenaers, MJE
    De Coster, J
    Puers, R
    [J]. MEMS 2004: 17TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2004, : 777 - 780
  • [6] Micromachined variable capacitors with wide tuning range
    Xiao, ZX
    Peng, WY
    Wolffenbuttel, RF
    Farmer, KR
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 2003, 104 (03) : 299 - 305