GROWTH OF AgInSe2 ON Si(100) SUBSTRATE BY PULSE LASER ABLATION

被引:10
作者
Pathak, Dinesh [1 ]
Bedi, R. K. [1 ]
Kaur, Davinder [2 ,3 ]
机构
[1] Guru Nanak Dev Univ, Dept Phys, Mat Sci Lab, Amritsar 143005, Punjab, India
[2] Indian Inst Technol Roorkee, Dept Phys, Roorkee, Uttar Pradesh, India
[3] Indian Inst Technol Roorkee, Ctr Nanotechnol, Roorkee, Uttar Pradesh, India
关键词
Atomic force microscopy; optical properties of thin films; semiconductors; X-ray diffraction; THIN-FILMS; TEMPERATURE; DEPOSITION;
D O I
10.1142/S0218625X09013487
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Laser ablation has attracted special interest for the growth of thin films. It allows the formation of high quality layers and maintain stoichiometry in the films of even very complex elemental materials. In this work, high quality AgInSe2 (AIS) films were grown onto Si( 100) substrates kept at different temperatures using ultra high vacuum pulsed laser deposition (PLD) technique from the AIS target synthesized from high-purity materials. It has been observed that compositional stoichiometry is largely maintained in the films. This suggests that PLD could be used as technique for fabrication of ternary semi-conducting films. The X-ray diffraction studies of the films show that films are textured in ( 112) direction. The structural and optical properties have been investigated as a function of substrate temperature. An increase in substrate temperature results in a more ordered structure. Roughness of the films is found to increase at higher deposition temperatures. The optical studies of the films show that the optical band gap lies in the range 1.20-1.27 eV.
引用
收藏
页码:917 / 924
页数:7
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