Size-dependent electrical constriction resistance for contacts of arbitrary size: from Sharvin to Holm limits

被引：98

作者：

Mikrajuddin, A

Shi, FG ^{[1
]}

Kim, HK

Okuyama, K

机构：

[1] Hiroshima Univ, Fac Engn, Hiroshima 7398527, Japan

[2] Univ Calif Irvine, Sch Engn, Irvine, CA 92697 USA

来源：

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | 1999年 / 2卷 / 04期

基金：

日本学术振兴会;

关键词：

constriction resistance; Holm resistance; Sharvin resistance; size and pressure effect;

D O I：

10.1016/S1369-8001(99)00036-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A general analytical expression for the size-dependent constriction (contact) resistance is obtained For nonquantum contacts of arbitrary size as a solution of Laplace's equation with appropriate boundary conditions. The new analytical expression contains both the Helm resistance and the Sharvin resistance as the asymptotic limits for the: respective large and small contact sizes relative to the mean free path of electrons. This first general theoretical result is fully supported by available experimental data on the pressure dependence of contact resistance. (C) 2000 Elsevier Science Ltd. All rights reserved.

引用

页码：321 / 327

页数：7

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