Photolabile Well-Defined Polystyrene Grafted on Silica Nanoparticle via Nitroxide-Mediated Polymerization (NMP)

被引：6
|
作者：
Ho, Hien The [1 ,2 ]
Phan, Trang N. T. [1 ]
Bonnevide, Marine [3 ]
Malicki, Nicolas [3 ]
Couty, Marc [3 ]
Jestin, Jacques [2 ]
Gigmes, Didier [1 ]
机构：
[1] Aix Marseille Univ, CNRS, Inst Chim Radicalaire, Ave Escadrille Normandie Niemen, Marseille, France
[2] Univ Paris Saclay, Lab Leon Brillouin, CEA Saclay, F-91191 Gif Sur Yvette, France
[3] Mfg Francaise Pneumat MICHELIN, Site Ladoux, 23 Pl Carmes Dechaux, F-63040 Clermont Ferrand 9, France
来源：
MACROMOLECULAR RAPID COMMUNICATIONS | 2021年 / 42卷 / 18期
关键词：
photoresponsive materials; polymer-grafted silica nanoparticles; surface-initiated nitroxide-mediated polymerization; SURFACE; NANOCOMPOSITES; OPPORTUNITIES; DELIVERY; POLYMERS; BRUSHES; RELEASE;
D O I：
10.1002/marc.202100181
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Herein, the synthesis of a novel nitroxide-mediated polymerization (NMP) initiator bearing a photolabile ortho-nitrobenzyl (oNB) group allowing surface-initiated NMP preparation of well-defined photoresponsive polystyrene grafted on silica nanoparticles is described. The photocleavable and photoresponsive properties of the prepared materials are demonstrated using small angle X-ray scattering (SAXS) characterization.
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页数：5
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