Performance analysis of a Ge/Si core/shell nanowire field-effect transistor

被引:141
作者
Liang, Gengchiau [1 ]
Xiang, Jie
Kharche, Neerav
Klimeck, Gerhard
Lieber, Charles M.
Lundstrom, Mark
机构
[1] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[2] Purdue Univ, Network Computat Nanotechnol, W Lafayette, IN 47907 USA
[3] Harvard Univ, Dept Chem & Biol Chem, Cambridge, MA 02138 USA
[4] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
D O I
10.1021/nl062596f
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We ana/lyze the performance of a recently reported Ge/Si core/shell nanowire transistor using a semiclassical, ballistic transport model and an sp(3)d(5)s* tight-binding treatment of the electronic structure. Comparison of the measured performance of the device with the effects of series resistance removed to the simulated result assuming ballistic transport shows that the experimental device operates between 60 and 85% of the ballistic limit. For this similar to 15 nm diameter Ge nanowire, we also find that 14-18 modes are occupied at room temperature under ON-current conditions with I-ON/I-OFF = 100. To observe true one-dimensional transport in a < 110 > Ge nanowire transistor, the nanowire diameter would have to be less than about 5 nm. The methodology described here should prove useful for analyzing and comparing on a common basis nanowire transistors of various materials and structures.
引用
收藏
页码:642 / 646
页数:5
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