Highly charged ions generated with intense laser beams

被引：4
作者：
Krása, J
Jungwirth, K
Králiková, B
Láska, L
Pfeifer, M
Rohlena, K
Skála, J
Ullschmied, J
Hnatowicz, V
Perina, V
Badziak, J
Parys, P
Wolowski, J
Woryna, E
Szydlowski, A
机构：
[1] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic
[2] ASCR, Inst Plasma Phys, Prague 18221 8, Czech Republic
[3] ASCR, Inst Nucl Phys, Rez 25068, Czech Republic
[4] Inst Plasma Phys & Laser Microfus, PL-00908 Warsaw, Poland
[5] Soltan Inst Nucl Studies, PL-05400 Otwock, Poland
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 205卷
关键词：
laser-produced plasma; highly charged ions; ion implantation; windowless electron multiplier;
D O I：
10.1016/S0168-583X(03)00960-1
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The emission of highly charged Auq+. and Taq+ (1 less than or equal to q less than or equal to 50) ions from plasmas produced with the PERUN and PALS iodine laser systems at the Institute of Physics in Prague operating at various laser beam intensities and laser wavelengths is presented. The laser-produced plasmas provide ions moving with velocity up to approximate to5 x 10(6) m/s and ion currents reaching approximate to230 A/m(2) at a standard distance of 1 m. The ion implantation with no external acceleration of the generated ions into an Al substrate is presented. The effect of q and vi on the absolute measurement of ion currents with an electron multiplier is discussed. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：355 / 359
页数：5
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