Lithographic tuning of a two-dimensional photonic crystal laser array

被引：62

作者：

Painter, O ^{[1
]}

Husain, A

Scherer, A

Lee, PT

Kim, I

O'Brien, JD

Dapkus, PD

机构：

[1] CALTECH, Dept Elect Engn, Pasadena, CA 91125 USA

[2] Univ So Calif, Dept Elect Engn Electrophys, Los Angeles, CA 90089 USA

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2000年 / 12卷 / 09期

关键词：

InGaAsP; laser array; microcavities; photonic crystals; quantum-well laser; semiconductor device fabrication;

D O I：

10.1109/68.874210

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

One attraction of photonic crystals is the ability to control optical device characterstics by lithographically varying the geometry. In this letter we demonstrate a 10 x 10 array of optically pumped two-dimensional (2-D) photonic crystal defect lasers with varying lattice parameters. By adjusting the photonic crystal interhole spacing as well as the hole diameter we are able to tune the laser wavelength from 1500 to 1625 nm on a monolithic InP-In-GaAsP wafer. A wavelength resolution of 10 nm from device to device was obtainable, Limited by the lithography and etching tolerances of our fabrication method.

引用

页码：1126 / 1128

页数：3

共 8 条

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