Shallow angle x-ray diffraction from in-situ silica:titania sol-gel thin films

X-ray diffraction at shallow angles of incidence has been used to examine three silica:titania sol-gel thin films. Comparison with transmission x-ray diffraction measurements of similar materials in the bulk shows a distinct increase in disorder in the silica network. An increase in porosity of the network in thin films is also likely, suggested by an increase in Si-O-H bonds. No differences in structure between samples with differing titania contents were observed using this technique.