Environmental scanning electron microscopy study of the fine structure of the triple line and Cassie-Wenzel wetting transition for sessile drops deposited on rough polymer substrates
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作者:
Bormashenko, Edward
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Coll Judea & Samaria, Res Inst, IL-44837 Ariel, IsraelColl Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
Bormashenko, Edward
[1
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Bormashenko, Yelena
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机构:Coll Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
Bormashenko, Yelena
Stein, Tamir
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机构:Coll Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
Stein, Tamir
Whyman, Gene
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机构:Coll Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
Whyman, Gene
Pogreb, Roman
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机构:Coll Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
Pogreb, Roman
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[1] Coll Judea & Samaria, Res Inst, IL-44837 Ariel, Israel
[2] Tel Aviv Univ, Wolfson Appl Mat Res Ctr, IL-69978 Tel Aviv, Israel
The wetting of rough honeycomb micrometrically scaled polymer substrates was studied. A very strong dependence of the apparent contact angle on the drop volume has been established experimentally. The environmental scanning electron microscopy study of the fine structure of the triple line is reported first. The triple line is not smooth and prefers grasping the polymer matrix over air holes. The precursor rim surrounding the drop has been observed. The revealed dependence of the apparent contact angle on the drop volume is explained by the transition between the pure Cassie and combined Wenzel-Cassie wetting regimes, which is induced by capillarity penetration of water into the holes of relief.
机构:CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France
Bico, J
Thiele, U
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机构:CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France
Thiele, U
Quéré, D
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CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, FranceCNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France
机构:CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France
Bico, J
Thiele, U
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机构:CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France
Thiele, U
Quéré, D
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CNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, FranceCNRS, Coll France, URA 792, Lab Phys Mat Condensee, F-75231 Paris 05, France