Oxidation of sputtered W-based coatings

被引:15
作者
Cavaleiro, A
Louro, C
Montemor, F
机构
[1] Univ Coimbra, Fac Ciencias & Tecnol, ICEMS, Dep Eng Mecan, Coimbra, Portugal
[2] Inst Super Tecn, Lisbon, Portugal
关键词
oxidation resistance; W-Based films; sputtering;
D O I
10.1016/S0257-8972(00)00784-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper, a review of the influence of the addition of different chemical elements to some transition metal nitrides and carbides on their oxidation behaviour will be presented. The role of the addition of 'reactive elements' (RE) on the type of oxide phases formed, on the morphology of the oxide layers, on the oxidation kinetics and on the oxidation rate is emphasized. Examples of the system W-N/C when Ti, Ni and Si are added, will be shown. The beneficial action of the additional element on oxidation resistance can be due either to the formation of some type of protective oxide layer, apart from the typical oxides formed for those metal compounds, or to the blocking effect to the elemental diffusion, which is due to some type of compound precipitation in the diffusion paths. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:441 / 447
页数:7
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