共 18 条
Reversible wettability of nanostructured ZnO thin films by sol-gel method
被引:52
作者:
Lue, Jianguo
[1
,2
]
Kai Huang
[3
]
Chen, Xuemei
[2
]
Zhu, Jianbo
[2
]
Meng, Fanming
[1
]
Song, Xueping
[1
]
Sun, Zhaoqi
[1
]
机构:
[1] Anhui Univ, Sch Phys & Mat Sci, Hefei 230039, Peoples R China
[2] Hefei Normal Univ, Dept Phys & Elect Engn, Hefei 230061, Peoples R China
[3] Anhui Univ Architecture, Dept Math & Phys, Hefei 230601, Peoples R China
基金:
中国国家自然科学基金;
关键词:
ZnO;
Sol-gel;
Surface topography;
Reversible wettability;
Hydrophobicity;
ANNEALING TEMPERATURE;
SURFACES;
HYDROPHILICITY;
TRANSITION;
D O I:
10.1016/j.apsusc.2010.02.080
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Nanostructured ZnO thin films were deposited on Si(1 1 1) and quartz substrate by sol-gel method. The thin films were annealed at 673 K, 873 K, and 1073 K for 60 min. Microstructure, surface topography, and water contact angle of the thin films have been measured by X-ray diffractometer, atomic force microscopy, and water contact angle apparatus. XRD results showed that the ZnO thin films are poly-crystalline with hexagonal wurtzite structure. AFM studies revealed that rms roughness changes from 2.3 nm to 7.4 nm and the grain size grow up continuously with increasing annealing temperature. Wettability results indicated that hydrophobicity of the un-irradiated ZnO thin films enhances with annealing temperature increase. The hydrophobic ZnO surfaces could be reversibly switched to hydrophilic by alternation of UV illumination and dark storage (thermal treatment). By studying the magnitude and the contact angle reduction rate of the light-induced process, the contribution of surface roughness is discussed. (C) 2010 Elsevier B. V. All rights reserved.
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页码:4720 / 4723
页数:4
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