Realization of KaptonTM based optical interconnect by KMnO4 wet etching

被引:7
作者
Cai, D. K. [1 ]
Neyer, A. [1 ]
机构
[1] Tech Univ Dortmund, Fak Elektrotech & Informat Tech, D-44227 Dortmund, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2010年 / 99卷 / 04期
关键词
INTEGRATION;
D O I
10.1007/s00339-010-5723-z
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the paper, based on KMnO4 wet-etching technology PDMS (polydimethylsiloxane) based flexible optical interconnect packaged with Kapton(TM) (Dupont) foils was successfully realized through a stable and effective bonding technology. The optical and mechanical properties of the PDMS waveguide layer remained unchanged before and after packaging with KMnO4 etched Kapton foils. The mechanical stability limit of the tested optical interconnects is determined only by the intrinsic mechanical stability of the used PDMS materials. The optical loss at 850 nm is < 0.05 dB/cm even after temperature treatments up to lead-free soldering temperatures of 260A degrees C. In addition, the main mechanism of forming a good bonding between PDMS and Kapton foil was identified and analyzed as well.
引用
收藏
页码:783 / 789
页数:7
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