Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

被引：10

作者：

Kanamori, Yoshiaki ^{[1
]}

Sato, Junya

Shimano, Takeshi

Nakamura, Shigeo

Hane, Kazuhiro

机构：

[1] Tohoku Univ, Dept Nanomech, Sendai, Miyagi 9808579, Japan

[2] Hitachi Ltd, Cent Res Lab, Yokohama, Kanagawa 2440817, Japan

[3] Hitachi Ltd, Mech Engn Res Lab, Hitachi, Ibaraki 3120034, Japan

来源：

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2007年 / 13卷 / 8-10期

关键词：

D O I：

10.1007/s00542-007-0380-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed techniquehas been demonstrated by the fabrication of tens-like structures.

引用

页码：1411 / 1416

页数：6

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