Photo-stability of a-Si solar cells fabricated by "Liquid-Si printing method" and treated with catalytic generated atomic hydrogen

被引：2

作者：

Murayama, Hiroko ^{[1
]}

Ohyama, Tatsushi ^{[1
]}

Yoshida, Isao ^{[1
]}

Terakawa, Akira ^{[1
]}

Masuda, Takashi ^{[2
,3
]}

Ohdaira, Keisuke ^{[2
]}

Shimoda, Tatsuya ^{[2
,3
]}

机构：

[1] Panasonic Corp, Device Solut Ctr, Moriguchi, Osaka 5708501, Japan

[2] Japan Adv Inst Sci & Technol, Nomi City, Ishikawa 9231292, Japan

[3] JST ERATO Shimoda Nanoliquid Proc Project, Nomi City, Ishikawa 9231292, Japan

来源：

THIN SOLID FILMS | 2015年 / 575卷

基金：

日本科学技术振兴机构;

关键词：

Amorphous Si; Solar cells; Stability; Liquid-Si; Cyclopentasilane; Atomic hydrogen treatment; Cat-CVD; AMORPHOUS-SILICON; OPTICAL GAP; FILMS; SILANE; PLASMA;

D O I：

10.1016/j.tsf.2014.10.034

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The film properties and solar cell performances of hydrogenated amorphous silicon (a-Si:H) fabricated by a newly developed non-vacuum process "Liquid-Si printing method" were systematically investigated by comparing to the conventional plasma-chemical vapor deposition method. The as-printed a-Si:H films showed relatively high Urbach-tail characteristic energy (E-ch), high [Si-H-2]/[Si-H], and low photoconductivity (similar to 10(-7) S/cm). However, the [Si-H-2]/[Si-H] decreased, and the photoconductivity was improved to the device grade level (similar to 10(-5) S/cm) after appropriate catalytic-generated atomic hydrogen treatment. It was also found that the light-induced degradation of the photoconductivity and solar cell efficiency of the printed samples were less than half of the conventional a-Si: H case. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：100 / 102

页数：3

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