Red emission from Eu-implanted GaN

被引:0
作者
Son, CS
Kim, SI [1 ]
Kim, YH
Kim, YT
Choi, IH
Wakahara, A
Tanoue, H
Ogura, M
机构
[1] Silla Univ, Dept Photon, Pusan 617736, South Korea
[2] KIST, Semicond Mat Lab, Seoul 130650, South Korea
[3] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[4] Toyohashi Univ Technol, Dept Elect & Elect Engn, Toyohashi, Aichi 4418580, Japan
[5] AIST, Tsukuba, Ibaraki 3058568, Japan
关键词
Eu; GaN; implantation; photoluminescence;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Eu ions were implanted into GaN epilayers on sapphire substrates. Sharp visible red emission lines due to inner 4f shell transitions for Eu3+ can be observed from the photoluminescence of Eu-implanted GaN. The 5D(0) -->F-7(2) transition produces the strongest red emission line. Minor lines are observed in the given spectral range. The lines at 546, 603, 624, and 667 nm are assigned to D-5(1) -->F-7(1) and D-5(0) -->F-7(1,2,3) transitions, respectively. These emission lines are little changed with varying temperature. Eu-implanted GaN can be a suitable material for application in red emission devices.
引用
收藏
页码:S519 / S521
页数:3
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